• Our expertise

     

    A unique and advanced technological solution dedicated to the oxidation phase involved in the manufacture of VCSELs

     

  • Alox Furnace 1.4

     

    Designed for realizing the wet thermal oxidation of III-V compound semiconductors

     

  • Who are we?

     

    Pioneers in materials processing today and tomorrow.

     

Real time in-situ optical monitoring

Automatic oxidation diameter control

Oxide aperture uniformity σ < 0.45 µm on 6” wafer *

Run-to-run deviation σ < 0.05 μm *

Discover with the Youtube video below the first version of the Alox machine developed from 2008 and replaced since then by a new version much more successful: GEN 1.4

 

ALOX 1.4 Specifications

 

  • Up to 6” wafers : edge exclusion 5 mm
  • Selective oxidation process
  • Oxide aperture uniformity max – min < 0.8 µm*
  • Tight flow control of moisturized gas : 0,6 to 30 g/h
  • Vacuum atmosphere : <10 to 800 mbar absolute
  • Stabilized temperature 350°C to 600°C
  • Full control / supervision of machine
  • Programming of recipes
  • Automatic monitoring software to stop mesa oxidation attargeted operture (optional)
  • Run-to-run deviation σ < 0.2 μm *

* For common results, depending on wafer

Our scientific partners

 

The universities of Berkeley in USA, and of Cardiff in Wales/UK agreed to let us use their ALOX system for demonstrations. On the process part, we benefit from the technological and scientific support granted by our CNRS/LAAS consultant.

The Laboratory of Analysis and Architecture of Systems (LAAS) is a CNRS research unit linked with the Institute for Engineering and Systems Sciences (INSIS) and the Institute of Information Sciences and their interactions (INS2I).

The Marvell NanoLab, located in the CITRIS headquarters building, Sutardja Dai Hall , includes more than 15,000 sq feet of Class100 and Class1000 cleanroom.

KTPs provide knowhow and funding that can help organisations break free from established ways of working to experience new ideas and processes that boost performance and cut costs.

Views of oxidation process over time

Applications

Alox furnace is destined to R&D and manufacturing of semiconductor devices in the fields of Photonics

 

VCSEL

 

The vertical-cavity surface-emitting laser, or VCSEL is a type of semiconductor laser diode. VCSEL applications include fiber optic communications, precision sensing, computer mice and laser printers.

Laser Diodes

 

A laser diode is a semiconductor device. Wide range of uses that include fiber optic communications, barcode readers, laser pointers, laser printing, laser scanning and light beam illumination.

Waveguides

 

A waveguide is an optical structure that directs the electromagnetic waves of an optical spectrum. Widely used in : optical fiber communication, photonic integrated circuits, and optical interferometers.

 

Exhibitions

Upcoming tradeshows

Semicon Taiwan 2022

14-16 September, 2022
TaiNEX 1, Taipei, Taïwan
USA

CIOE 2022

7-9 September, 2022
SZCEC, Shenzhen, China
Gyeonggi-do, KOREA

Semicon China 2022

15-17 March, 2022
SNIEC, Shanghai, China
CHINA

Photonics West 2022

21-27 February, 2022
San Francisco, California, USA

The group

 

We are able to offer our clients an end-to-end approach thanks to our technical skills and the experience of our teams.

A 360° value proposition in thermal equipment for research laboratories and industry

 

Tailor-made and standard technological solutions for a wide range of applications

 

Standard equipment solutions for laboratories and industry

 

Want to know more?

 

Contact our team

 

Get precise information about our services.