ALOX GEN1.4 Auto Light industrial wet oxidation furnace for VCSEL production

ALOX GEN1.4L Auto

For prod & multiple products dev

The ALOX GEN1.4L Auto is the newest addition to the ALOXTEC portfolio: an equipment that combines the compactness and characterization richness of the ALOX GEN1.4L Manual with automated wafer loading and a groundbreaking process innovation that redefines uniformity standards for wet thermal oxidation.

60+ tools used worldwide in 21 customers sites
Support and Sales representatives in EU, Asia & US

Technical specifications of the ALOX GEN1.4L Auto

 

Specification Value
Throughput 800–1000 wafers/month
Wafer sizes 3” to 8”
Loading
  • Automatic wafer loading
  • SECS/GEM connectivity
  • Fully automatic mode (production tools)
Process window
  • Temperature 350°C to 600°C
  • Pressure few mbar to 800 mbar
  • Water flow 0.6 to 30 g/h
With UniformPerf© (factory option or field upgrade)
  • σ < 0.1 µm
  • min-max < ±0.3 µm on 6’’
Without UniformPerf©
  • σ <0,25 µm
  • min-max < ±0.6 µm on 6’’ wafers
4 in 1 capability Automatic loading & unloading + Oxidation + Characterization + Annealing in a single cycle
Low W2W dev. σ < 0.05 µm on 6” wafers
Proprietary vision system
  • In situ live vision
  • Automatic “stop on right oxidation diameter”
  • Aperture target until < 3 µm
  • X/Y/Z motion with full wafer view
  • 2 cameras (low and high magnification)
  • Monochromator capability included
High homogeneity chamber
  • Anti bow system
  • Several heating zones control
  • 1 gas lines for optimised reliability
Supervision and vision software
  • User friendly interface
  • Automatic pattern recognition
  • Automatic process & measurement algorithms
ALOX GEN1.4 Auto Light automated platform for VCSEL oxidation annealing and characterisation

The best « all in 1 » solution for high-performance VCSELs oxidation

 

The 2026 innovation: rotation and in-situ measurement during oxidation

For the first time in wet thermal oxidation, the ALOX GEN1.4L Auto introduces wafer rotation during the oxidation phase. This innovation optimizes oxidation uniformity across the wafer by precisely controlling local temperature and water vapour gradients within the furnace chamber, ensuring consistent oxidation rates across all areas.

By rotating the wafer during oxidation, the ALOX GEN1.4L Auto averages out these gradients across the full wafer surface. In addition, ALOXTEC’s proprietary in-situ vision system continues to operate and provide real-time measurements throughout the rotation: a technical achievement that represents a world first in the field.

Innovative and proven ‘Stop on exact aperture size’ automated process prior to in-line & real time vision system.

The ALOX GEN1.4L Auto delivers outstanding uniformity, with aperture variation staying within σ < 0.25 µm on 6″ (without our UniformPerf© option), and a Run-to-Run average oxidation aperture under 0.2 µm. Its innovative ‘Stop on exact aperture size’ automated process, combined with an in-line real-time vision system, ensures a highly repeatable and controlled oxidation — proven across the full range of EPI complexity, from 3 to several hundred epitaxial layers.

Full process capacitance and control on Pressure (from few mbar to PA), Temperature (up to 600°C) and Waterflow (from 5g/h to 100g/h)

The ALOX GEN1.4L Auto offers full process control over the three critical parameters of thermal oxidation: pressure (from a few mbar to atmospheric), temperature (up to 600°C), and water vapor flow (5 g/h to 100 g/h). Multi-zone heating architecture compensates for EPI wafer-to-wafer variability, while low-pressure process capability combined with in-situ annealing ensures high-reliability oxide layers. This complete parametric control enables precise shaping of mesa geometries to meet the most demanding VCSEL device specifications.

Best industrial TCO of the market

Designed for both R&D and high-volume production environments, the ALOX GEN1.4L Auto supports wafer formats from 3″ to 8″ with an industrial throughput of up to 1000 wafers per month, directly impacting yield and time-to-market. As a 3-in-1 equipment integrating Oxidation, Annealing, and Characterization in a single tool, it significantly reduces CAPEX and OPEX footprint. The equipment features a user-friendly HMI, full SECS/GEM connectivity, and flexible loading modes — manual or automatic — backed by local support, spare parts availability, and dedicated training services.

Key Benefits of the ALOX GEN1.4L Auto

Best User friendliness
in the market

 

saving opex time including SECS/GEM connectivity

Uncompared Reliability
with a proven track record

 

The largest global installed base of wet thermal Oxidation tool + Local China, Taiwan, US and EU own support & spares

ALOX GEN1.4 Auto Light production-scale wet oxidation system for VCSEL wafers

Key Features of the ALOX GEN1.4L Auto

 

The group

 

We are able to offer our clients an end-to-end approach thanks to our technical skills and the experience of our teams.

A 360° value proposition in thermal equipment for research laboratories and industry

 

Tailor-made and standard technological solutions for a wide range of applications

 

Standard equipment solutions for laboratories and industry

 

Induction is a fast, precise, easily amortizable heating method with low CO2 emissions.

Induction is a fast, precise, easily amortizable heating method with low CO2 emissions.

 

Want to know more?

 

Contact our team

 

Get precise information about our services.

 

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